MUNICH, Germany — In a move to put more focus on a key product area, Germany's Suss MicroTec here today combined its separate lithography-tool and optical subsystem operations into a new entity. The ...

IBM develops an optical lithography technique capable of producing structures less than 32 nm in size which its says gives the industry seven years of breathing space. Scientists at IBM say they have ...

Recently, Professor Lu Zhengang's team at Harbin Institute of Technology proposed a non-microscope objective lithography method that utilizes the spherical convex lens aberration, enabling laser beams ...

PORTLAND, Ore. — Optical lithography can be extended to 12 nanometers, according to Massachusetts Institute of Technology researchers who have so far demonstrated 25-nm lines using a new technique ...

Photonic Lattice, Inc. introduces a range of optical elements to produce axisymmetric polarizations at 1064nm – a new tool for applications including optical trapping, materials processing, optical ...

Extreme ultraviolet lithography (EUVL) has emerged as a cornerstone technology in the semiconductor industry, enabling the production of devices with sub-10 nm feature sizes. By utilising a 13.5 nm ...

Professor Bruce Smith has been a member of the engineering faculty at RIT since joining the Microelectronic Engineering program in 1988. He is currently also the Director of the Microsystems ...

Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...

(Nanowerk Spotlight) Optical metasurfaces are sub-wavelength nanopatterned layers that interact strongly with light, thus dramatically altering the light properties over a sub-wavelength thickness.

Building an integrated circuit (IC) requires various physical and chemical processes to be performed on a semiconductor (e.g., silicon) substrate. Millions of transistors can be fabricated and wired ...