Hitachi, Ltd.and Renesas Technology Corp. announced that they have developed low-voltage embedded SRAM technology for SoC's (system-on-a-chip) beyond the 90-nm process node. Using new circuit ...
Tokyo, June 12, 2007 −− Renesas Technology Corp. today announced the development of a technology that is effective in implementing SRAM in processes of the 32 nm (nanometer) generation and beyond, for ...
Toshiba Corporation today announced that it has developed a breakthrough technology that achieves low voltage operation of System LSI, opening the way to reduced power consumption in digital products.
High yield achieved for the world's smallest level 6-transistor SRAM memory-cell area (0.494µm 2) ; stabilization technique addresses variability of transistor characteristics. Tokyo, June 15, 2006 −− ...
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