Atomic layer etching (ALE) offers chipmakers more than just the precise removal of targeted material — etching both directionally (in one direction) or isotopically (in all directions). Furthermore, features with different aspect ratios can be etched the same amount, minimizing or eliminating aspect ratio dependent etching (ARDE). We power ALE with products like Flex®. https://bit.ly/4lju9qx | Lam Research Corporation

As 3D NAND technology advances, the demand for greater deposition and etch intensity grows. Adding more memory layers requires not only innovative engineering but also precise material deposition and enhanced etch techniques. See how applying stress-compensating materials and leveraging molybdenum for improved conductivity ensure reliable scaling and more in the video below. | Lam Research Corporation